A new instrument under development at the National Institute of Standards and Technology (NIST) uses infrared laser light to precisely measure the thickness of 300 millimeter silicon wafers. NIST ...

To help the semiconductor industry measure 300-mm wafers, researchers at the National Institute of Standards and Technology (NIST) have developed an infrared instrument that measures differences in ...

Description: This product features an “8” laser target indicator; enhanced, colored, and backlit LCD display; and a 12:1 field of view. It allows contractors to view the screen in sunlight or darkness ...

The new Heidenhain probe is a simple alternative to laser measurement systems. With its newly designed TT 449 tool touch probe, Heidenhain has introduced an infrared tool probe for use with ...

Fujifilm has unveiled a special infrared version of the 100-megapixel, medium-format GFX100 designed for "forensic, scientific and cultural preservation applications," the company announced. The ...

The Canadian firm’s Decima Gemini infrared measurement technology has been updated to measure performance and characteristics of transparent conductive oxide layers key in heterojunction cell ...

Klein Tools has launched a 20:1 Dual-Laser Infrared Thermometer, which offers a wide measurement range, a tight distance-to-spot ratio, dual targeting lasers and several calculation modes. It enables ...

In the last few years, semiconductor circuit features have shrunk to sub-100 nanometer (nm) dimensions, while the size of the thin silicon wafers that these circuits are constructed on has grown from ...